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CCH2O UC PARKA 8 – CAP & GOWN (Special Order)
The CCH2O UC Parka was designed to enhance the chilling efficiency of the Under Current systems by providing an insulating barrier from grow room atmospheric conditions.
The UC Parka’s 96% reflective material reflects heat, while also retaining the cool temperatures of the nutrient solution. Double bubble design protects against UV damage and is moisture resistant. Made in the USA.
This model suits the current culture under current 8 system
*Special order - no returns, no exchanges
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